Plasma processing device and baffle plate thereof

Details Plasma processing device and baffle plate thereof Plasma processing device and baffle plate thereof

2006-09-19

2006-09-19

Tran, Thuy Vinh (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

With tangential fluent material supply

C315S111710

Reexamination Certificate

active

07109660

ABSTRACT:
A plasma processing device is able to positively enhance a process-gas exhaust efficiency in a processing region and restrict plasma leaking. A processing container of a magnetron type parallel plate plasma processing device has a separator for separating the inside of the processing container into a processing region and an exhaust region. The separator has a plurality of gas passage holes to establish communication between the processing region and the exhaust region, and consists of a non-conductive member. A conductive member is disposed on a gas passage-side surface facing the gas passage holes. A voltage V is applied by a power supply to the conductive member so that the gas passage-side surface is at a potential higher than that of a processing-region surface.

REFERENCES:
patent: 5605637 (1997-02-01), Shan et al.
patent: 6264788 (2001-07-01), Tomoyasu et al.
patent: 6379756 (2002-04-01), Komino
patent: 2002/0038791 (2002-04-01), Okumura et al.
patent: 786794 (1997-07-01), None
patent: 07-245295 (1995-09-01), None
patent: 11-121437 (1999-04-01), None

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