Plasma processing device

Details Plasma processing device Plasma processing device

2006-10-03

2006-10-03

Hassanzadeh, Parviz (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With gas inlet structure

C118S7230MW, C156S345360, C156S345410, C156S345340

Reexamination Certificate

active

07115184

ABSTRACT:
A plasma processing apparatus includes a processing vessel, a means for holding a substrate to be processed, an evacuation system coupled to the processing vessel, a means for supplying plasma gas to an interior of the processing vessel, a microwave antenna provided on the processing vessel, and a process gas supply part comprised of two components. The first component includes a plurality of first apertures for passing through plasma formed in interior of the processing vessel, a process gas passage, and a plurality of second apertures in communication with the process gas passage. The second component includes a plurality of third apertures axially aligned with the first apertures in the first component and diffusion surfaces upon recessed areas of the second component, located opposite to the second apertures in the first component.

REFERENCES:
patent: 4590042 (1986-05-01), Drage
patent: 5010842 (1991-04-01), Oda et al.
patent: 5105761 (1992-04-01), Charlet et al.
patent: 5595602 (1997-01-01), Harlan
patent: 5643394 (1997-07-01), Maydan et al.
patent: 5656334 (1997-08-01), Doi
patent: 5746875 (1998-05-01), Maydan et al.
patent: 5861601 (1999-01-01), Sato et al.
patent: 6162323 (2000-12-01), Koshimizu
patent: 6245192 (2001-06-01), Dhindsa et al.
patent: 6286454 (2001-09-01), Hirayama et al.
patent: 6436487 (2002-08-01), Ikemoto et al.
patent: 6663715 (2003-12-01), Yuda et al.
patent: 6772827 (2004-08-01), Keller et al.
patent: 2001/0052322 (2001-12-01), Hirayama et al.
patent: 2002/0002948 (2002-01-01), Hongo et al.
patent: 2003/0106643 (2003-06-01), Tabuchi et al.
patent: 1115147 (2001-07-01), None
patent: 9-63793 (1997-03-01), None
patent: 10251855 (1998-09-01), None
patent: 10340891 (1998-12-01), None
patent: 11-111708 (1999-04-01), None
patent: 11-168094 (1999-06-01), None
patent: 2000-58294 (2000-02-01), None
patent: 2000-195800 (2000-07-01), None
patent: 2000195800 (2000-07-01), None
patent: 2001020074 (2001-01-01), None
patent: 2001-49442 (2001-02-01), None
patent: 2002-64104 (2002-02-01), None
patent: 93-283028 (1995-05-01), None
patent: 1995-0015620 (1995-06-01), None
patent: 0077485 (2000-12-01), None
patent: WO-0074127 (2000-12-01), None
Office Action issued in corresponding Korean Application (w/english translation).
Office Action issued in corresponding Korean Application (w/English translation).
Supplementary European Search Report dated Oct. 20, 2005 for Application No. EP 02 70 7229.

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