Plasma processing device

Details Plasma processing device Plasma processing device

2006-08-29

2006-08-29

Alejandro-Mulero, Luz (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

C118S7230MW

Reexamination Certificate

active

07097735

ABSTRACT:
In a microwave plasma processing apparatus that uses a radial line slot antenna, the efficiency of cooling of a shower plate is optimized and simultaneously the efficiency of microwave excitation is optimized, by causing a radiation surface of the radial line slot antenna to make an intimate contact with a cover plate that forms a part of an outer wall of the processing chamber and makes an intimate contact with the shower plate.

REFERENCES:
patent: 4883686 (1989-11-01), Doehler et al.
patent: 5248370 (1993-09-01), Tsui et al.
patent: 5342472 (1994-08-01), Imahashi et al.
patent: 6059922 (2000-05-01), Yamazaki et al.
patent: 6322662 (2001-11-01), Ishii et al.
patent: 6357385 (2002-03-01), Ohmi et al.
patent: 6388632 (2002-05-01), Murakawa et al.
patent: 6736930 (2004-05-01), Hongoh
patent: 2001/0050059 (2001-12-01), Hongo et al.
patent: 09-063793 (1997-03-01), None
patent: 2000-223298 (2000-08-01), None
patent: 2000-277508 (2000-10-01), None
patent: WO 00/74127 (2000-12-01), None

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