Plasma processing apparatus with a dielectric body in the wavegu

Details Plasma processing apparatus with a dielectric body in the wavegu Plasma processing apparatus with a dielectric body in the wavegu

1998-05-28

2000-07-04

Bettendorf, Justin P.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511171, 31323131, 156345, 118723MA, H05H 146

Patent

active

06084356&

ABSTRACT:
Dielectric bodies are arranged in waveguide portions for passing microwave radiation and for holding a plasma generating chamber 25 at a vacuum. The dielectric bodies are arranged to intersect at least an electron cyclotron resonance area of the waveguide portions. A tip end portion of the dielectric bodies at a side of the plasma generating chamber are positioned toward at a side of the plasma generating chamber from an intermediate portion in an axial direction length of a first permanent magnet which is arranged by enclosing an outer periphery of the waveguide portions, and a tip end portion of the dielectric bodies at a side of the plasma generating chamber is substantially consistent with an inner face of the plasma generating chamber.

REFERENCES:
patent: 5279669 (1994-01-01), Lee
patent: 5620522 (1997-04-01), Ichimura et al.
patent: 5824606 (1998-10-01), Dible et al.

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