Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1996-06-14
1998-09-08
Pascal, Robert J.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
118723MW, 118723MP, 20429838, C23C 1600
Patent
active
058049231
ABSTRACT:
A plasma processing apparatus includes a microwave introducing member, which is provided with a microwave transmission opening through which microwaves pass into a processing chamber. The microwave introducing member is also provided at a transmission opening with a dielectric member. Preferably, the dielectric member is formed to have a relative dielectric constant of 4 to 10 and an insulation resistance of 10.sup.8 to 10.sup.12 .OMEGA..
REFERENCES:
patent: 4992665 (1991-02-01), Mohl
patent: 5529632 (1996-06-01), Katayama et al.
patent: 5545258 (1996-08-01), Katayama et al.
Akimoto Takeshi
Iio Kouichi
Katayama Katsuo
Komachi Kyouichi
Pascal Robert J.
Sumitomo Metal Industries Limited
Vu David H.
LandOfFree
Plasma processing apparatus having a protected microwave transmi does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma processing apparatus having a protected microwave transmi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing apparatus having a protected microwave transmi will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1284590