Plasma processing apparatus having a protected microwave transmi

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating

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118723MW, 118723MP, 20429838, C23C 1600

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active

058049231

ABSTRACT:
A plasma processing apparatus includes a microwave introducing member, which is provided with a microwave transmission opening through which microwaves pass into a processing chamber. The microwave introducing member is also provided at a transmission opening with a dielectric member. Preferably, the dielectric member is formed to have a relative dielectric constant of 4 to 10 and an insulation resistance of 10.sup.8 to 10.sup.12 .OMEGA..

REFERENCES:
patent: 4992665 (1991-02-01), Mohl
patent: 5529632 (1996-06-01), Katayama et al.
patent: 5545258 (1996-08-01), Katayama et al.

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