Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1994-11-21
1996-03-26
Pascal, Robert J.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511171, 31323131, 313240, 313268, H01J 724
Patent
active
055023550
ABSTRACT:
A plasma processing apparatus capable of widening a distance of a narrow gap formed along peripheral portions of the opposed electrodes without deterioration of the efficiency. In the apparatus, two electrodes are provided in parallel to each other within a vacuum processing chamber, and a surface of a wafer supported by either one of these electrodes is processed by reactive gas plasma produced between the electrodes by applying high frequency power to one of the electrodes, a narrow gap portion whose gap distance is narrower than that of an opposite space sandwiched between central portions of the two electrodes is formed along peripheral portions of the two electrodes, an ground shield made of conductive material is provided via an insulating member so as to cover the outer side surface of one electrode, the ground shield covers an outer surface of the electrode, and an annular extension portion which extends into the narrow gap portion is provided inside an edge portion of the ground shield.
REFERENCES:
patent: 4985114 (1991-01-01), Okudaira et al.
patent: 5173641 (1992-12-01), Imahashi et al.
patent: 5252892 (1993-10-01), Koshiishi et al.
patent: 5320982 (1994-06-01), Tsubone et al.
Anelva Corporation
Pascal Robert J.
Philogene Haissa
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