Plasma processing apparatus for etching, ashing and film-formati

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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Details

1180501, 134 1, 156643, 20429838, 20429837, B44C 122, C23C 1400, B05D 306

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active

050340867

ABSTRACT:
A plasma processing apparatus includes a vacuum vessel defining a discharge chamber is provided at least a source gas supply for supplying a processing gas into the discharge chamber a magnetic field creating device, a microwave introducing device. The microwave introducing device employs a microwave radiating member having the shape of a flat plate and provided with a cut. The plasma processing apparatus is capable of uniformly processing a work with a plasma and efficiently applying a microwave only to the work. The periphery of a microwave transmission window is tapered, so that the microwave transmission window can be attached adhesively and hermetically to a microwave launcher in a simple construction, whereby the reliability of the adhesive attachment of the microwave transmission window to the microwave launcher is enhanced.

REFERENCES:
patent: 4611121 (1986-09-01), Miyamura et al.
patent: 4761199 (1988-08-01), Sato
patent: 4776918 (1988-10-01), Otsubo et al.
patent: 4778561 (1988-10-01), Ghanbari

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