Plasma processing apparatus and plasma processing method

Details Plasma processing apparatus and plasma processing method Plasma processing apparatus and plasma processing method

1995-03-23

1997-07-29

Niebling, John

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

118723E, H05H 124

Patent

active

056520298

ABSTRACT:
In a plasma processing apparatus including a cylindrical electrode and plural electrodes which are disposed to face the cylindrical electrode in a circumferential direction of the cylindrical electrode, the plural electrodes are designed to have the prescribed curvature corresponding to that of the surface of the cylindrical electrode. The interval between the cylindrical electrode and the plural electrodes may be fixed or stepwise varied in the circumferential direction. The area of each of the plural electrodes may be different from that of the other electrodes.

REFERENCES:
patent: 5108571 (1992-04-01), Ludwig
patent: 5296036 (1994-03-01), Matsuyama
patent: 5300189 (1994-04-01), Kokaku
patent: 5437725 (1995-08-01), Schuster

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