Plasma processing apparatus and plasma cleaning method

Details Plasma processing apparatus and plasma cleaning method Plasma processing apparatus and plasma cleaning method

1992-08-25

1993-12-14

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156656, 156665, 156345, 134 1, H01L 21306, B44C 122, C23F 100

Patent

active

052698815

ABSTRACT:
There are disclosed apparatus and method for eliminating, by plasma cleaning, reaction products which are generated by etching and stick to an inner wall surface of a chamber. First to third conductive blocks (90a to 90c) are mounted on the inner wall surface of the chamber (50) through an insulator (92). A high-frequency electric field is applied sequentially between a first electrode (61) and the respective conductive blocks (90a to 90c) while a reactive gas is introduced into an internal space (51) of the chamber (50), to produce a plasma of the reactive gas. The reaction products which stick to the respective conductive blocks (90a to 90c) are sequentially gasified by the plasma of the reactive gas and exhausted to the outside of the chamber (50) to be eliminated.

REFERENCES:
patent: 4786352 (1988-11-01), Benzing
patent: 4786392 (1988-11-01), Kruchowski et al.
patent: 5068002 (1991-11-01), Monroe
patent: 5084125 (1992-01-01), Aoi

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