Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Reexamination Certificate
2011-07-05
2011-07-05
Fureman, Jared J (Department: 2836)
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
Reexamination Certificate
active
07974067
ABSTRACT:
In a plasma processing apparatus having an electrostatic chuck for holding a semiconductor wafer by an electrostatic adsorption force and a DC power supply for applying an electrostatic adsorption voltage to the electrostatic chuck, abnormal discharge in plasma is suppressed by providing the apparatus with a signal detector that detects a foresee signal that foresees occurrence of abnormal discharge in plasma, and a controller that controls ESC leakage current based upon the foresee signal. If the foresee signal is outside a prescribed range, control is exercised so as to reduce the absolute value of the electrostatic adsorption voltage, thereby suppressing the occurrence of an abnormal discharge.
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English translation of JP 2003-318115, Yakaka Mitsuo, Jul. 11, 2003, “Window Type Probe, Pasma Monitoring Apparatus, and Plasma Treatment Apparatus”.
Itagaki Yousuke
Ito Natsuko
Uesugi Fumihiko
Yasaka Mitsuo
Fureman Jared J
Ieva Nicholas
Renesas Electronics Corporation
Sughrue & Mion, PLLC
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