Plasma processing apparatus and method for venting the same...

Details Plasma processing apparatus and method for venting the same... Plasma processing apparatus and method for venting the same...

2008-02-22

2011-10-04

Gambetta, Kelly M (Department: 1715)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

Reexamination Certificate

active

08029874

ABSTRACT:
In a plasma processing apparatus provided with control means, gas supply means includes a first gas supply path for supplying a vent gas into a processing chamber by way of a shower plate and a second gas supply path for supplying a vent gas into the processing chamber without via the shower plate, and the control means is capable of adjusting a flow rate of the vent gas of at least one of the first and second gas supply paths in such a manner that a pressure on a back side of the shower plate becomes a pressure that is a positive pressure relative to a pressure in the processing chamber and less than a withstand pressure of the shower plate.

REFERENCES:
patent: 2006/0016559 (2006-01-01), Kobayashi et al.
patent: 2002-246374 (2002-08-01), None
patent: 2002246374 (2002-08-01), None
patent: 2006-041088 (2006-02-01), None

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