Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Electrical signal parameter measurement system
Reexamination Certificate
2011-03-15
2011-03-15
Feliciano, Eliseo Ramos (Department: 2857)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Electrical signal parameter measurement system
C702S117000, C356S316000, C315S111410, C156S345350, C156S345480, C156S345510, C118S7230AN, C118S7230VE
Reexamination Certificate
active
07908104
ABSTRACT:
The invention provides a method for detecting and managing the status of a plasma processing apparatus with high sensitivity so as to enable long-term stable processing. In a plasma processing apparatus comprising a vacuum processing chamber10, a plasma generating high frequency power supply16,and a measurement device unit3for estimating the status of the apparatus via reflected waves54of the incident waves53reflected from the processing apparatus including a waveform generator32, a VCO33, a directional coupler34, a detector35and a measurement data processing unit36, frequency-swept high frequency waves53for measurement are introduced to the processing chamber where no plasma discharge is performed, so as to monitor the change of absorption spectrum frequency of the reflected waves54to thereby monitor the change in status of the processing apparatus.
REFERENCES:
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patent: 2007/0006972 (2007-01-01), Piptone et al.
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Itabashi Naoshi
Itou Atsushi
Tetsuka Tsutomu
Antonelli, Terry Stout & Kraus, LLP.
Desta Elias
Feliciano Eliseo Ramos
Hitachi High-Technologies Corporation
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