Plasma processing apparatus and method

Details Plasma processing apparatus and method Plasma processing apparatus and method

1993-11-29

1997-11-11

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

C23C 1600

Patent

active

056859139

ABSTRACT:
A plasma processing apparatus and method is equipped with a vacuum chamber, helmholtz coils, a microwave generator and gas feeding systems. An auxiliary magnet is further provided in order to strengthen the magnetic field in the vacuum chamber to produce centrifugal drifting force which confine the plasma gas about the center position of the vacuum chamber.

REFERENCES:
patent: 4125431 (1978-11-01), Fowler
patent: 4430138 (1984-02-01), Suzuki
patent: 4727293 (1988-02-01), Asmussen
patent: 4960073 (1990-10-01), Suzuki et al.
patent: 4973883 (1990-11-01), Hirose et al.
patent: 5039548 (1991-08-01), Hirose

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