Plasma processing apparatus and method

Details Plasma processing apparatus and method Plasma processing apparatus and method

2005-04-26

2005-04-26

Wong, Don (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C315S111210, C118S7230IR

Reexamination Certificate

active

06885153

ABSTRACT:
A method for determining the potential of a plasma in a processing chamber includes determining voltages of respective plasma engaging surfaces of at least two plasma generating electrodes disposed within the processing chamber and determining the plasma potential by comparing the determined voltages and equating the highest determined voltage to the plasma potential.

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patent: 5415718 (1995-05-01), Ohmi et al.
patent: 5433813 (1995-07-01), Kuwabara
patent: 5849136 (1998-12-01), Mintz et al.
patent: 6252354 (2001-06-01), Collins et al.
patent: 0 598 128 (1994-05-01), None
patent: 308778 (1996-02-01), None

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