Plasma processing apparatus and method

Details Plasma processing apparatus and method Plasma processing apparatus and method

1987-04-16

1989-02-07

Boudreau, Leo H.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511111, 315358, 21912136, 31323141, B23K 900

Patent

active

048034053

ABSTRACT:
The present invention relates to a plasma processing apparatus capable of obtaining a satisfactory plasma arc and a processing method used by this plasma processing apparatus.
The plasma processing apparatus is constructed to vary an electric current or a voltage during start up at a fixed period for a fixed time. The plasma processing apparatus has a plasma power source capable of controlling an electric current or a voltage applied to a plasma torch, and an electrode and a nozzle are communicated by means of an electrification in the plasma torch.
In a method for performing a plasma process by a plasma processing apparatus, a mixing gas has a ratio of Hydrogen to Argon in a range from 5 to 20 Vol %, and a frequency of a plasma electric current is controlled in a range from 10 to 30 KHz.

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patent: 4663515 (1987-05-01), Kneeland et al.
patent: 4663567 (1987-05-01), Wong

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