Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1995-09-14

1996-09-24

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723IR, 118723E, 156345, C23C 1600

Patent

active

055587224

ABSTRACT:
A plasma processing apparatus includes a vacuum vessel, a substrate electrode, a discharge coil which is partially or wholly made to have a multiple spiral or helical configuration, a high frequency power source, and a matching circuit that is connected to the discharge coil by way of a conductor wire and connected to the high frequency power source via a connection cable, and generates plasma inside the vacuum vessel by applying a high frequency voltage to the discharge coil so as to process a substrate disposed on the substrate electrode.

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Okumura et al., High Density Plasma Etching Apparatus "E620/E630" of Denshi Zairyo, Mar. 1995, pp. 1-2.
Okumura et al., 8th Symposium on Plasma Science for Materials, Japan Society for the Promotion of Science, Committee 153, Jun. 1995.
Matsushita Electric Industrial Co., Ltd., Catalog of Dry Etching Apparatus E620 for Silicone Compounds, Dec. 1994.

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