Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1998-03-13

1999-06-22

Shingleton, Michael B

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511141, 361234, H01J 724

Patent

active

059145684

ABSTRACT:
A plasma processing apparatus has a susceptor with a mount surface on which an electrostatic chuck is arranged. The electrostatic chuck is formed of one inner chuck segment and four outer chuck segments. The chuck segments are arrayed with gaps interposed therebetween to prevent the electrostatic chuck from being distorted due to thermal stress.

REFERENCES:
patent: 4911814 (1990-03-01), Matsuoka et al.
patent: 5055964 (1991-10-01), Logan et al.
patent: 5547539 (1996-08-01), Arasawa et al.
patent: 5671116 (1997-09-01), Husain
patent: 5671117 (1997-09-01), Sherstinsky et al.
patent: 5764471 (1998-06-01), Burkhart

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