Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1994-11-14

1998-03-17

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429806, 20429807, 20429808, 20429825, 156345, C23C 1434

Patent

active

057282781

ABSTRACT:
A plasma processing apparatus has a vacuum container which contains a pair of electrodes for causing a discharge for generating a plasma, and a shielding plate for separating a plasma processing region including a space between the electrodes from a region in contact with the inner wall of the vacuum container in such a manner that both the regions communicate with each other. The apparatus includes a means for causing a pressure difference between the plasma processing region and the region in contact with the inner wall of the vacuum container.

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