Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1988-12-08
1990-11-13
Laroche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
118 501, 118715, 31323131, H01J 724, H01J 1726, H05B 3126, C23C 1400
Patent
active
049704354
ABSTRACT:
In a plasma processing apparatus of this invention, a reaction chamber opposed to a plasma generating chmaber is entirely opened at its one side surface opposing the obect to be processed, and an interval between the one side surface and the other side surface is set to be an integer multiple of a 1/2 wavelength of the microwave. A microwave oscillated by a microwave oscillator and supplied to a vacuum vessel can be converted into a plasma energy with high conversion efficiency, thereby minimizing a reflected wave.
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Proc. International Engineering Congress-ISIAT'83 & IPAT'83, Kvoto (1983); K. Asakawa, et al. pp. 759-764.
Fukuoka Susumu
Hamada Yuki
Sasaki Yasushi
Shimada Yutaka
Tanaka Susumu
LaRoche Eugene R.
Shingleton Michael B.
Tel Sagami Limited
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