Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1998-10-16

2000-08-22

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Work support

C23C 1600

Patent

active

061066311

ABSTRACT:
A plasma processing apparatus comprising a susceptor and a shadow frame in a processing chamber and used to process a substrate supported by a substrate support tray by using plasma discharge, the shadow frame being disposed so as to be movably by a guide mechanism provided on the inner wall of the processing chamber. The plasma processing apparatus, capable of carrying out high-speed processing, causes less trouble, requires less number of parts and has a high degree of flexibility in the layout of the processing chamber, while maintaining the advantages of a conventional plasma processing apparatus.

REFERENCES:
patent: 5352294 (1994-10-01), White et al.
patent: 5843233 (1998-12-01), Van De Ven et al.
patent: 5879459 (1999-03-01), Gadgil et al.
patent: 5882417 (1999-03-01), Van De Ven et al.
patent: 5909994 (1999-06-01), Blum et al.

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