Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

2005-10-11

2005-10-11

Wong, Don (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C118S7230ER

Reexamination Certificate

active

06954033

ABSTRACT:
A plasma processing apparatus of the present invention includes a matching circuit for impedance matching between a radio-frequency generator and a plasma processing chamber, and one or a plurality of impedance converting circuits provided between the matching circuit and the radio-frequency generator. The impedance converting circuit converts an impedance to decrease a difference in impedance to be matched by the matching circuit, thereby decreasing a change in the output impedance with a moving amount of a capacitance control of one of variable passive elements of the matching circuit, such as a load capacitor and a tuning capacitor. Therefore, a change in the impedance of the plasma processing chamber can be finely controlled.

REFERENCES:
patent: 5605576 (1997-02-01), Sasaki et al.
patent: 6252354 (2001-06-01), Collins et al.
patent: 6259334 (2001-07-01), Howald
patent: 6806438 (2004-10-01), Nakano et al.
patent: 2001/0009139 (2001-07-01), Shan et al.

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