Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

2005-01-04

2005-01-04

Wong, Don (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C313S231310, C118S7230AN

Reexamination Certificate

active

06838833

ABSTRACT:
A plasma processing apparatus provided with a holding stage of a system in which a temperature of an electrode block is controlled so as to control the temperature of a semiconductor wafer. The electrode block is provided with at least first and second independent temperature controllers on inner and outer sides thereof, and a slit for suppressing heat transfer is provided in the electrode block between the first and second temperature controllers.

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