Plasma pinch X-ray method

Details Plasma pinch X-ray method Plasma pinch X-ray method

1984-09-13

1986-12-30

Church, Craig E.

X-ray or gamma ray systems or devices

Source

378121, H01J 3500, H05B 3122

Patent

active

046334920

ABSTRACT:
A method is provided for producing plasma pinch X-rays usable in X-ray lithography. Ionized heated plasma is repeatably generated in a first area directly from solid material without exploding the latter. X-rays are generated in a second area by passing high current through the plasma causing radial inward magnetic field pinching. Accurate control and improved intensity performance, and greater flexibility in selection of X-ray emitting materials, are provided by the separation of the plasma generating and the X-ray pinch generating functions.

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patent: 4536884 (1985-08-01), Weiss et al.
Okabe et al., "Aluminum Plasma X-Ray Source for Lithography," Electrochemical Society, Montreal, Canada, May 9-14, 1982, pp. 522-523.

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