Plasma inducing plate for semiconductor deposition apparatus

Details Plasma inducing plate for semiconductor deposition apparatus Plasma inducing plate for semiconductor deposition apparatus

2009-01-16

2009-12-29

Sikder, Selina (Department: 2912)

Equipment for production, distribution, or transformation of ene

Distribution, modification or control

Semiconductor, transistor or integrated circuit

Design Patent

active

D0606952

CLAIM:
The ornamental design for a plasma inducing plate for semiconductor deposition apparatus, as shown and described.

REFERENCES:
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patent: 2005/0252447 (2005-11-01), Zhao et al.
patent: 2007/0076345 (2007-04-01), Bang et al.
patent: 2007/0258184 (2007-11-01), Lee
patent: 2008/0308230 (2008-12-01), Takahashi et al.
U.S. Appl. No. 29/322,630, filed Aug. 7, 2008, Aggarwal et al.

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