Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2007-05-23
2011-10-04
Chen, Bret (Department: 1715)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C427S574000, C427S577000, C427S578000, C427S523000
Reexamination Certificate
active
08029875
ABSTRACT:
The present disclosure relates to a method for plasma ion deposition and coating formation. A vacuum chamber may be supplied, wherein the vacuum chamber is formed by a hollow substrate having a length, diameter and interior surface. A plasma may be formed within the chamber while applying a negative bias to the hollow substrate to draw ions from the plasma to the interior surface of the hollow substrate to deposit ions onto the interior surface and forming a coating. The coating may have a Vickers Hardness Number (Hv) of at least 500.
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Arps James H.
Rincon Christopher
Wei Ronghua
Chen Bret
Grossman Tucker et al.
Southwest Research Institute
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