Plasma generator with secondary radiator

Details Plasma generator with secondary radiator Plasma generator with secondary radiator

1992-02-28

1993-01-19

Pascal, Robert J.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31323131, 333 99PL, H05H 100

Patent

active

051809486

ABSTRACT:
The present invention is directed to a plasma generator which can generate a localized plasma. To localize the plasma, a low pressure plasma generator, containing a vacuum chamber and at least one microwave radiation source, which does not by itself produce a field strength sufficient to form plasma in the vacuum chamber, is equipped with at least one aerial for the radiation of microwaves. This at least one aerial acts as a secondary radiator in the vacuum chamber and can generate a localized plasma at its free tips.

REFERENCES:
patent: 4810935 (1989-03-01), Boswell
patent: 4902934 (1990-02-01), Miyamura et al.
patent: 4940015 (1990-07-01), Kobashi et al.
patent: 5111111 (1992-05-01), Stevens et al.
Patent Abstracts of Japan, vol. 15, No. 68(C-807), Feb. 18, 1991, & JP-A-294491, Dec. 5, 1990, K. Watanabe, et al., "Microwave Plasma Treating Device".

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