Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1997-02-27
1998-11-17
Pascal, Robert J.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511141, 118723AN, H05H 146
Patent
active
058381112
ABSTRACT:
A plasma generator operable in the UHF and VHF bands is adaptable to process substrates having different sizes and shapes. The device includes a plurality of electrodes, a power supply for providing a high frequency signal to at least one of the electrodes, and antennas attached to the plurality of electrodes. Antennas on one electrode are arranged substantially parallel and alternately to antennas attached to another adjacent electrode.
REFERENCES:
patent: 4968918 (1990-11-01), Kondo et al.
Hayashi Shigenori
Nakagawa Hideo
Bettendorf Justin P.
Matsushita Electric - Industrial Co., Ltd.
Pascal Robert J.
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