Plasma generator and associated ionization method

Details Plasma generator and associated ionization method Plasma generator and associated ionization method

1993-03-08

1994-10-04

Kwon, John T.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511181, H01J 724

Patent

active

053529545

ABSTRACT:
In the discharge chamber (21) of a device for generating plasma, used in the space sector for ion propulsion or for the discharging of satellites and in applications on the ground, suitable ionizing radiation sources (47) are provided, capable of improving the performance of said device. The radiation emitted by the sources creates constant ionization of the gas with advantages both during the preionization phase, i.e. starting of the device, and during the operating phase, standardizing the performance thereof in particular in terms of continuity and regularity of operation.

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patent: 5036252 (1991-07-01), Lob
patent: 5051659 (1991-09-01), Uhm et al.
patent: 5192894 (1993-03-01), Teschner
patent: 5216329 (1993-06-01), Pelleteir

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