Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2006-08-29
2006-08-29
Vo, Tuyet (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C343S701000
Reexamination Certificate
active
07098599
ABSTRACT:
The whole antenna conductor is housed in the interior of a vacuum container of a plasma generator thereby to eliminate the need for an insulating partition or a top plate so that the whole induction field radiated from the antenna can be effectively utilized. Furthermore, the occurrence of abnormal discharge is suppressed to stabilize a high-density plasma by reducing the inductance of the antenna and covering the antenna conductor with an insulator.
REFERENCES:
patent: 4649391 (1987-03-01), Tsuda et al.
patent: 5178739 (1993-01-01), Barnes et al.
patent: 5397962 (1995-03-01), Moslehi
patent: 5522934 (1996-06-01), Suzuki et al.
patent: 5565738 (1996-10-01), Samukawa et al.
patent: 5824158 (1998-10-01), Takeuchi et al.
patent: 6024827 (2000-02-01), Ishii
patent: 6033481 (2000-03-01), Yokogawa et al.
patent: 6387208 (2002-05-01), Satoyoshi et al.
patent: 6439154 (2002-08-01), Fukuda et al.
patent: 6499424 (2002-12-01), Kazumi et al.
patent: 6664548 (2003-12-01), Benveniste et al.
patent: 6694915 (2004-02-01), Holland et al.
patent: 2002/0175869 (2002-11-01), Wilcoxson et al.
patent: 0 838 839 (1998-04-01), None
patent: 5-507963 (1993-11-01), None
patent: 7-18433 (1995-01-01), None
patent: 7-45598 (1995-02-01), None
patent: 7-86191 (1995-03-01), None
patent: 7-201495 (1995-08-01), None
patent: 7-254500 (1995-10-01), None
patent: 7-263188 (1995-10-01), None
patent: 8-13169 (1996-01-01), None
patent: 8-81777 (1996-03-01), None
patent: 9-111460 (1997-04-01), None
patent: 10-189293 (1998-07-01), None
patent: 10-233297 (1998-09-01), None
patent: 10-241897 (1998-09-01), None
patent: 11-135438 (1999-05-01), None
patent: 11-233289 (1999-08-01), None
patent: 11-307299 (1999-11-01), None
patent: 2000-3878 (2000-01-01), None
patent: 2000-310697 (2000-11-01), None
patent: 2001-35697 (2001-02-01), None
Miyake Shoji
Setsuhara Yuichi
Shoji Tatsuo
Japan Science & Technology Corporation
McGlew & Tuttle PC
Vo Tuyet
Vy Hung Tran
LandOfFree
Plasma generator does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma generator, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma generator will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3700053