Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1997-11-17
1999-05-11
Wong, Don
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511151, 118623, 20429811, H01J7/24
Patent
active
059031069
ABSTRACT:
A plasma generating source for processing semiconductor integrated circuits is provided. The plasma generating source is configured to control the amount of electromagnetic energy and the distribution of the electric and magnet energies coupled to the plasma. The plasma generating source comprises a plasma containing region and a source of electromagnetic energy for generating a plasma. An electrostatic shield is disposed between the source of electromagnetic energy and the plasma containing region. The electrostatic shield has a plurality of openings therethrough configured to control the amount and distribution of electromagnetic energy coupled from the source into the plasma containing region. The openings may be configured in a variety of ways to control the magnitude and distribution of electromagnetic energy coupled to the plasma.
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Pacak Vojtech
Young Lydia J.
Philogene Haissa
WJ Semiconductor Equipment Group, Inc.
Wong Don
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