Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
1999-05-14
2001-01-30
Shingleton, Michael B (Department: 2817)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C315S111410, C315S111810, C118S7230AN, C118S7230IR, C118S7230ME, C118S7230AN
Reexamination Certificate
active
06181068
ABSTRACT:
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a plasma generating apparatus, and in particular, to a plasma generating apparatus for generating a large quantity of plasma using slipping surface discharge (SSD) and microwave discharge.
2. Discussion of Related Art
Microwave gas-discharge plasma source are of considerable current use in a modern technique and technology for a PCVD thin films deposition, etching of a metallic and dielectric samples, activation of dielectric samples, etc. The advantages of these sources consist in a relatively pure conditions of a plasma generation and maintenance as well as in a high efficiency of microwave source energy release in a plasma formation and as a consequence in the gas medium, etc. One of the main disadvantages of this method consists in a limited choosing of a working gases and relatively narrow limits of gas pressure at which gas discharge excitation is possible.
“Slipping” discharge along the metal-dielectric surfaces also falls in category of extensively using discharges: as a source of a powerful ultraviolet radiation in a molecular lasers, as a strong shock waves generator, etc. Among of this method advantages is possibility to excite discharge essentially in all gases and gaseous mixtures in a wide range of pressure: from deep vacuum (P≦10
−6
Torr) up to atmospheric pressure. Disadvantage of method consists in particular in a principle pulse work with relatively low attainable average energy release in the gas medium.
SUMMARY OF THE INVENTION
Accordingly, the present invention is directed to a plasma generating apparatus that substantially obviates one or more of the problems due to limitations and disadvantages of the related art.
An object of the present invention is to-provide a plasma generating apparatus which uses slipping surface discharge and microwave radiation to plasma production in different gases and gaseous mixtures at a wide range of gas pressure.
To accomplish the object of the present invention, there is provided a plasma generating apparatus including high voltage pulse means for generating a high voltage pulse, plasma generating means based on the slipping surface discharge, give rise of discharge as the high voltage pulse generated by high voltage pulse generating means is applied, microwave generating means for generating a microwave radiation form the microwave for producing plasma, a chamber in which the plasma generating means are placed, and the plasma collects, the chamber receiving the microwave radiation from the microwave generating means, and a gas inlet through which a specific gas flows into the chamber, to generate a large quantity of plasma according to the plasma generating means and microwave generating means.
It is to be understood that both the forgoing general description and the following detailed description are exemplary and explanatory and are intended to provide further explanation of the invention as claimed.
REFERENCES:
patent: 5276386 (1994-01-01), Watanabe et al.
Bark Yoo Byung
Gritsinin Sergei
Hur Bang Uk
Kossyi Igor
Sergeitchev K. F.
Dae Won Paptin Form Co., Ltd.
Kallman Nathan N.
Shingleton Michael B
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