Plasma etching reactor with surface protection means against ero

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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216 67, 438731, H01L 213065

Patent

active

056413750

ABSTRACT:
A thin flexible removeable shield made of electrically conducting material presses against the interior walls of an apertured processing chamber to protect the processing chamber walls from erosion from the reactive plasma gases. The shield and walls are electrically interconnected with a sleeve-like conductive insert overlapping a surface portion of the shield and passing through the shield and lining a chamber aperture, with the insert also insuring the positioning of the insert against the wall. The remaining exposed surface of the shield has a protective anodization. A conductive connector preferably also connects the insert to another interior chamber structure at the same electrical potential as the chamber walls.

REFERENCES:
patent: 3623968 (1971-11-01), Bohne
patent: 4473455 (1984-09-01), Dean et al.
patent: 5047115 (1991-09-01), Charlet et al.
patent: 5082547 (1992-01-01), DeLarge
patent: 5085727 (1992-02-01), Steger
patent: 5099100 (1992-03-01), Bersin et al.
patent: 5330607 (1994-07-01), Nowicki
patent: 5348587 (1994-09-01), Eichman et al.

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