Plasma etching process and apparatus

Details Plasma etching process and apparatus Plasma etching process and apparatus

1982-06-09

1983-09-20

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156657, 1566591, 156345, 204192E, 204298, 252 791, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

044054068

ABSTRACT:
A plasma etching process and apparatus wherein a gas plasma comprising dichlorofluoro-methane (CHCl.sub.2 F) etches a film.

REFERENCES:
patent: 3880684 (1975-04-01), Abe
patent: 3984301 (1976-10-01), Matsuzaki et al.
patent: 4233109 (1980-11-01), Nishizawa
J. Vac. Sci. Technol., vol. 13, No. 5, Sep./Oct. 1976, Dry Process Technology (Reactive Ion Etching) by James A. Bondur, pp. 1023-1029.

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