Plasma etching of aluminum

Details Plasma etching of aluminum Plasma etching of aluminum

1982-03-25

1983-02-08

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156656, 1566591, 156665, 204192E, 252 791, C23F 102

Patent

active

043728073

ABSTRACT:
A method of improving the uniformity and line-width control in the plasma etching of aluminum and its alloys by adding to the etchant gas an effective amount of a gaseous hydrocarbon which will polymerize under glow discharge conditions.

REFERENCES:
patent: 4333793 (1982-06-01), Lifshitz et al.
patent: 4343677 (1982-08-01), Kinsbron et al.
Vossen, Pure and Applied Chemistry, vol. 52, pp. 1759-1765 (1980).

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