Plasma etching of aluminum

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

156646, 156656, 1566591, 156665, 204192E, 252 791, C23F 102

Patent

active

043728073

ABSTRACT:
A method of improving the uniformity and line-width control in the plasma etching of aluminum and its alloys by adding to the etchant gas an effective amount of a gaseous hydrocarbon which will polymerize under glow discharge conditions.

REFERENCES:
patent: 4333793 (1982-06-01), Lifshitz et al.
patent: 4343677 (1982-08-01), Kinsbron et al.
Vossen, Pure and Applied Chemistry, vol. 52, pp. 1759-1765 (1980).

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