Plasma etching apparatus having a sealing member coupling an upp

Details Plasma etching apparatus having a sealing member coupling an upp Plasma etching apparatus having a sealing member coupling an upp

1999-09-03

2000-06-13

Beck, Shrive

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118723E, H05H 100, C23C 1600

Patent

active

060745193

ABSTRACT:
A plasma etching apparatus is provided having a sealing member coupling an upper electrode to the plasma etching chamber. A peripheral portion of the inner surface of the upper electrode includes a planar surface across both anodized and non-anodized portions of the surface in the peripheral contact region adjacent to the upper portion of the sidewalls of the chamber assembly. A sealing member is positioned between the planar, peripheral portion of the second electrode and the upper portion of the sidewalls to provide a seal therebetween. The anodized portion of the inner surface of the upper electrode may extend over the area adjacent to the opening in the chamber housing and further extend into the peripheral portion beyond the sealing member to reduce the potential for arcing to occur to the non-anodized section during plasma etching operations. Plasma etching apparatus according to the present invention may provide improved sealing, thereby allowing improved control of vacuum level and concentration of processing gas within the plasma etching chamber during etching operations.

REFERENCES:
patent: 3757733 (1973-09-01), Reinberg
patent: 5348587 (1994-09-01), Eichman et al.
patent: 5722668 (1998-03-01), Rice et al.
Excerpts of MXP Manual, 1997.
One Page from TEL UNITY II 855 DD.

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