Plasma etcher having isotropic subchamber with gas outlet for pr

Details Plasma etcher having isotropic subchamber with gas outlet for pr Plasma etcher having isotropic subchamber with gas outlet for pr

1980-07-29

1982-10-05

Paschall, M. H.

Electric heating

Metal heating

By arc

219121PF, 219121PG, 219121PQ, 156646, 156643, 250531, 250539, 204192E, 204164, B23K 900, C23F 102

Patent

active

043529747

ABSTRACT:
A plasma etcher wherein the provision of a gas outlet directly in an etching chamber is avoided and wherein a subchamber having a sufficient capacity is connected to the etching chamber through a joint part, the gas outlet being provided in this subchamber. With the apparatus, the distribution of etching rates in plasma etching becomes uniform.

REFERENCES:
patent: Re30244 (1980-04-01), Alexander, Jr. et al.
patent: 3875068 (1975-04-01), Mitzel
patent: 4153528 (1979-05-01), Dykerman et al.
patent: 4209357 (1980-06-01), Gorin et al.
patent: 4230515 (1980-10-01), Zajac

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