Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1987-05-13
1989-01-10
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
134 1, 156646, 156655, 156668, 20419236, 252 791, B44C 122, C03C 1500, C03C 2506, B29C 3700
Patent
active
047971789
ABSTRACT:
The present invention provides a process for plasma cleaning and an improved gas mixture for use in a plasma cleaning process. The gas mixture of the present invention includes the normal process gases such as oxygen and carbon tetrafluoride. However, the mixture also includes a small percentage of a large mass inert gas such as Argon or Krypton. This large mass gas molecule mechanically removes any polymerized fluorocarbon that forms on the surface being cleaned thereby significantly enhancing the rate of etch or cleaning.
It has been found that five to twenty percent of the inert gas is the preferred range and that ten percent produces optimum results.
REFERENCES:
patent: 4472238 (1984-09-01), Johnson
patent: 4601782 (1986-07-01), Bianchi et al.
patent: 4654115 (1987-03-01), Egitto et al.
patent: 4689111 (1987-08-01), Chan et al.
patent: 4720322 (1988-01-01), Tiffin
"Optical Emission Spectroscopy of Reactive Plasmas: A Method of Correlating Emission Intensities to Reactive Particle Densities", J. W. Coburn et al, J. Appl. Phys. 51 (6), Jul. 1980.
Bui Vu Q.
Chan Kevin K.
Hoffarth Joseph G.
Malueg Vicki J.
Galbi Elmer W.
International Business Machines - Corporation
Powell William A.
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