Plasma etch apparatus with conductive coating on inner metal sur

Details Plasma etch apparatus with conductive coating on inner metal sur Plasma etch apparatus with conductive coating on inner metal sur

1990-05-21

1992-02-04

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 20429831, H01L 21306, B44C 122

Patent

active

050857274

ABSTRACT:
An improved plasma etching apparatus is disclosed comprising an etch chamber having inner metal surfaces with a conductive coating formed thereon which is capable of protecting such inner metal surfaces from chemical attack by reactant gases such as halogen-containing gases used in said chamber during plasma etching processes. In a preferred embodiment, at least about 0.2 micrometers of a carbon coating is formed on the inner metal surfaces of the etch chamber by a plasma-assisted CVD process using a gaseous source of carbon and either hydrogen or nitrogen or both.

REFERENCES:
patent: 4427516 (1984-01-01), Levinstein et al.
patent: 4526644 (1985-07-01), Fujiyama et al.
patent: 4693777 (1987-09-01), Hazano et al.

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