Plasma-enhanced pulsed deposition of metal carbide films

Details Plasma-enhanced pulsed deposition of metal carbide films Plasma-enhanced pulsed deposition of metal carbide films

2008-05-07

2010-02-23

Ahmed, Shamim (Department: 1792)

Coating processes

Coating by vapor, gas, or smoke

Carbon or carbide coating

C427S535000, C427S569000

Reexamination Certificate

active

07666474

ABSTRACT:
Methods of forming a metal carbide film are provided. In some embodiments, a substrate is exposed to alternating pulses of a transition metal species and plasma-excited argon. The transition metal species is reacted with a carbon species to deposit a metal carbide film. The substrate is exposed to the carbon species simultaneously with the transition metal species, or the substrate is exposed to the carbon species in pulses temporally separated from the pulses of the transition metal species. In some embodiments, the carbon species and the transition metal species form parts of the same precursor compound, e.g., a metal organic compound.

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