Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1997-03-13
1999-03-02
Padgett, Marianne
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427575, 427576, H05H 120, H05H 130
Patent
active
058768084
ABSTRACT:
A plasma enhanced chemical vapor deposition process for depositing a titanium nitride film on a polymeric substrate is provided, the process including placing the polymeric substrate within a chemical vapor deposition chamber evacuated to a pressure within a range of from about 0.1 Torr to about 10 Torr, heating the polymeric substrate to a temperature within a range of from about 150.degree. C. to about 250.degree. C., introducing a vaporized organometallic compound and ammonia gas into the chamber, generating a plasma within the chamber, and, maintaining the polymeric substrate within the chamber for a time sufficient for a layer of titanium nitride to deposit upon the polymeric substrate.
REFERENCES:
patent: 4600202 (1986-07-01), Schaeffler et al.
patent: 5089438 (1992-02-01), Katz
patent: 5173327 (1992-12-01), Sandhu et al.
patent: 5246881 (1993-09-01), Sandhu et al.
patent: 5290609 (1994-03-01), Horiike et al.
patent: 5344792 (1994-09-01), Sandhu et al.
patent: 5413851 (1995-05-01), Storer
patent: 5711987 (1998-01-01), Bearinger et al.
F. J. McGarry et al., "Ceramic Coated Rigid Rod Polymer Fibers," SAMPE Quarterly, Jul. 1992, pp. 35-38.
Fix et al, "Titanium Nitride Thin films: Properties & APCVD Synthesis using organometallic precursors", Mat. Resch. Soc. Symposium Proc., vol. 2(3) pp. 357-362, 1990 No month.
Fix et al, "Synthesis of Thin Films by Atmospheric Pressure Chemical Vapor Deposition Using Amido and Zmido Titanium(IV) Compounds as Precursors", Chem. Mater., 1990, 2, pp. 235-241, 1990 No month.
Devlin David J.
Hall Lauren A.
Smith David C.
Cottrell Bruce H.
Padgett Marianne
The Regents of the University of California
LandOfFree
Plasma enhanced OMCVD of thin film coating for polymeric fibers does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma enhanced OMCVD of thin film coating for polymeric fibers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma enhanced OMCVD of thin film coating for polymeric fibers will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-420407