Plasma electron density measuring and monitoring device

Details Plasma electron density measuring and monitoring device Plasma electron density measuring and monitoring device

2006-06-13

2006-06-13

Lee, Wilson (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C315S111210, C324S639000

Reexamination Certificate

active

07061184

ABSTRACT:
The present invention discloses a device for measuring and monitoring electron density of plasma. The device includes a chamber filled with plasma having varying electron density; a frequency probe having transmission/receiving antennas and a pair of waveguides, one end of which is mounted in the chamber, for radiating and receiving electromagnetic waves; an electromagnetic wave generator electrically connected to one of the waveguides of the frequency probe for generating electromagnetic waves; and a frequency analyzer for scanning the frequency of received electromagnetic waves and analyzing the scanned frequency with respect to the amplitude of the received electromagnetic waves. Coupled to the rear end of the frequency probe is preferably a transfer unit having a hydraulic cylinder structure such that the frequency probe is moved in the chamber to detect the spatial distribution of electron density.

REFERENCES:
patent: 6455437 (2002-09-01), Davidow et al.
patent: 6573731 (2003-06-01), Verdeyen et al.
patent: 6744211 (2004-06-01), Sugai et al.
Shirakawa, Teruyuki, et al., “Plasma Oscillation Method for Measurements of Absolute Electron Density in Plasma”, Jpn. J. Appl. Phys., vol. 32, 1993, pp. 5129-5135.
Kokura, Hikaru, et al., “Plasma Absorption Probe for Measuring Electron Density in an Environment Soiled with Processing Plasmas”, Jpn. J. Appl. Phys., vol. 38, 1999, pp. 5262-5266.

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