Coating apparatus – Gas or vapor deposition – With treating means
Patent
1994-09-09
1996-10-01
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118723I, 20419232, 20429834, C23C 1600
Patent
active
055607764
ABSTRACT:
A plasma discharge apparatus includes a chamber in which plasma discharge is produced; an antenna composed of a loop coil formed from an electric conductor which can be supplied with R.F. power so as to produce a high frequency electric field in the chamber; and an electric shield of a shield layer of non-magnetic electrically conductive material which toroidally surrounds the coil and which has openings. The shield layer is grounded and electrically connected to the antenna so as to be a return circuit. The electric shield can be formed from a strip electric conductor toroidally wound to provide a spiral gap opening between turns. The strip can further be toroidally wound over the spiral gap but separated from the underlying strip layer to form a double layer shield.
REFERENCES:
patent: 4918031 (1990-04-01), Flamm et al.
patent: 5234529 (1993-08-01), Johnson
patent: 5387288 (1995-02-01), Shatas
Ichihara Katsutaro
Okubo Michiko
Sugai Hideo
Yasuda Nobuaki
Breneman R. Bruce
Kabushiki Kaisha Toshiba
Paladugu Ramamohan Rao
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