Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1997-12-31
2000-05-02
Bettendorf, Justin P.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
156345, H01J 746
Patent
active
060576456
ABSTRACT:
A plasma discharge device and method for removing material from a substrate having dynamic tuning, which permits operation with a variety of process gasses over a range of operating conditions. A longitudinally extending microwave cavity is defined at the ends by microwave traps, the positions of which are longitudinally adjustable to provide dynamic tuning. An adjustable antenna is provided, and operation utilizes the TM.sub.012 mode.
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Pellicier Victor
Pingree Richard E.
Srivastava Aseem K.
Bettendorf Justin P.
Eaton Corporation
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