Plasma development process controller

Details Plasma development process controller Plasma development process controller

1980-03-10

1981-04-21

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 356316, 356437, 430325, 430328, B44C 122, C03C 1500, C03C 2506

Patent

active

042630894

ABSTRACT:
End point detection in developing photoresist is accomplished by monitoring the output of a photodetector and sensing a plateau in the output.

REFERENCES:
patent: 4198261 (1980-04-01), Busta et al.
patent: 4201579 (1980-05-01), Robinson et al.
Kodak Microelectronics Seminar, 1976, A Study of the Optical Emission from a RF Plasma During Semiconductor Etching, by Harshbarger et al., pp. 1-24.

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