Plasma developable photoresist compositions containing N-substit

Details Plasma developable photoresist compositions containing N-substit Plasma developable photoresist compositions containing N-substit

1985-10-21

1987-04-21

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430277, 430278, 430 18, 430325, 522 67, 522167, G03C 170, G03C 176, G03C 194, G03C 516

Patent

active

046596488

ABSTRACT:
Disclosed is a photoresist using a 3-vinylcarbazole as the photopolymerizable monomer.

REFERENCES:
patent: 2791504 (1957-05-01), Plambeck
patent: 3899338 (1975-08-01), Lewis
patent: 3978029 (1976-08-01), Limburg
patent: 4113592 (1978-09-01), Rybny et al.
patent: 4278753 (1981-07-01), Lewis et al.
patent: 4302522 (1981-11-01), Garnett et al.

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