Plasma developable photoresist composition with polyvinyl formal

Details Plasma developable photoresist composition with polyvinyl formal Plasma developable photoresist composition with polyvinyl formal

1980-02-25

1981-07-14

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

156643, 430281, 430325, 430328, 430434, 430905, 430909, 430913, 430925, G03C 168, G03C 500

Patent

active

042787530

ABSTRACT:
A photosensitive composition useful as a photoresist which may be completely processed by dry techniques, especially by means of an oxygen plasma.
The composition includes an N-vinylmonomer and an organic hydrogen compound in a binder which contributes significantly to the utility of the composition in the fabrication of micro-electronic devices.

REFERENCES:
patent: 2902365 (1959-09-01), Martin
patent: 3899338 (1975-08-01), Lewis
patent: 3925077 (1975-12-01), Lewis et al.
patent: 4050941 (1977-09-01), Pazos

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