Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1991-03-18
1992-10-13
Beck, Shrive
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427163, 427166, 4272481, 188723, B05D 306
Patent
active
051549433
ABSTRACT:
A plasma-CVD process and apparatus for coating strongly arched, dome-like substrates with a dielectric and/or metallic coating system on the inside and/or outside face. The thickness of the gas layer to be reacted above the face to be coated is adjusted such as with the aid of the displacement body, so that the extent of the homogeneous reaction or formation occurring in the gas layer during a plasma phase is harmless for the desired coating quality. Strongly arched substrates coated with a uniform coating of highest optical quality and also mechanical, thermal and chemical stability without complicated substrate movement. Specified axial and azimuthal coating thickness profiles can also be superimposed by suitably shaping the displacement body.
REFERENCES:
patent: 3731650 (1973-05-01), Schweikert et al.
patent: 3926508 (1975-12-01), Harmsen et al.
patent: 4602847 (1986-07-01), Born et al.
patent: 4868004 (1989-09-01), Zultzke et al.
patent: 5030475 (1991-07-01), Ackermann et al.
C. M. Wolfe, Journal of the Electrochemical Society, Nov. 1974 pp. 1506-1509.
Patent Abstracts of Japan, vol. 13, No. 145, Apr. 10, 1989.
Etzkorn Heinz W.
Krummel Harald
Paquet Volker
Weidmann Gunter
Beck Shrive
Chen Bret
Schott Glaswerke
LandOfFree
Plasma CVD process for coating a dome-shaped substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma CVD process for coating a dome-shaped substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma CVD process for coating a dome-shaped substrate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1299186