Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1993-05-28
1995-02-21
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427573, 427574, 4272551, 4272552, B05D 306
Patent
active
053914104
ABSTRACT:
An amorphous silicon thin film is disclosed, which is produced by plasma CVD in which hydrogen-diluted SiH.sub.4 and N.sub.2 O are supplied during chemical vapor deposition as reacting source gases for the chemical vapor deposition, wherein the degree of hydrogen dilution is from 10 to 20.
REFERENCES:
patent: 4047998 (1977-09-01), Yoshikawa
patent: 4398054 (1983-08-01), Madan
patent: 4631198 (1986-12-01), Kakinuma et al.
patent: 4634601 (1987-01-01), Hamakawa et al.
patent: 4998968 (1991-03-01), Misumi
patent: 5137560 (1992-08-01), Ohmura
patent: 5140397 (1992-08-01), Haga et al.
Cros et al, "IR, ESR and resistivity measurements on amorphous silicon oxynitride films prepared by PECVD at low temperature", J. Non-cryst. Solids, 90(1-3) pp. 287-290, 1987.
The 22nd IEEE Photovoltaic Specialists Conference, Las Vegas, Oct. 7-11, 1991, pp. 1-6.
Ichikawa et al, "12% Two-Stacked a-Si:H tandem cells with a new P-layer Structure".
Patent Abstracts of Japan, vol. 016, No. 074 (E-1170) 24 Feb. 1992.
Japanese Journal of Applied Physics, vol. 25, No. 12, Dec. 1986, Tokyo JP, pp. 1778-1782, T. Kamimura et al `Effect on Hydrogen Dilution of Silane in Hydrogenated Amorphous Silicon Films Prepared by Photochemical Vapor Deposition`.
Japanese Journal of Applied Physics, vol. 25, No. 1, Jan. 1986, Tokyo JP, pp. L7-L9, T. Yoshida et al, `New Material for P-type Window Layer in A-Si Solar Cells`.
Kase Takahisa
Nii Tetsuro
Sichanugrist Porponth
King Roy V.
Showa Shell Sekiku K.K.
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