Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1994-03-18
1997-04-01
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427580, 427249, 427122, B05D 306, C23C 1626
Patent
active
056163738
ABSTRACT:
The invention relates to a method for depositing a diamond coating on a workpiece, for instance a drawing die or a tool punch, whereby a reactive plasma supported coating method is used. According to the invention the generation of the plasma is made by a direct current discharge, whereby additionally a flow of charged particles is fed into the discharge gap; according to the invention the workpiece to be coated is positioned in the discharge gap. Due to the inventive design a relatively long discharge gap can be used, such that also large surface areas can be coated; the coating is made at a location of the highest homogeneity and density of the plasma. By means of the invention a method is provided which can be controlled regarding financial expenses and in a reliable manner and which is suitable for large surface area coating.
REFERENCES:
patent: 4509451 (1985-04-01), Collins et al.
patent: 4731255 (1988-03-01), Maeda et al.
patent: 4749587 (1988-06-01), Bergmann et al.
patent: 4851254 (1989-07-01), Yamamoto et al.
patent: 4859490 (1989-08-01), Ikegaya et al.
patent: 5094878 (1992-03-01), Yamamoto et al.
Development of CVD Diamond Synthesis Techniques, S. Matsumoto, First International ECS Symposium, Los Angeles, 1989, pp. 1-11.
Diamond Film Preparation by Arc Discharge Plasma Jet Chemical Vapor Deposition in the Methane Atmosphere, Naoto Ohtake and Masanori Yoshikawa, J. Electrochem. Soc., vol. 137, No. 2, Feb. 1990, pp. 717-722.
"Diamond Synthesis By Hollow Cathode Plasma Assisted Chemical Vapor Deposition", B. Singh, O.R. Mesker et al., Spie vol. 877 Micro-Optoelectronic Materials, 1988, pp. 70-78.
"Growth Of Diamond Thin Films By Spiral Hollow Cathode Plasma-Assisted Chemical Vapor Deposition", Journal of Applied Physics, Bd. 65, No. 10, 15, Nov. 1989, New York, P. J. Kung and Y. Tzenig, pp. 4676-4684.
Bergmann Erich
Daxinger Helmut
Karner Johann
Balzers Aktiengesellschaft
King Roy V.
Weinstein Louis
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