Plasma CVD apparatus and method for forming a diamond like carbo

Details Plasma CVD apparatus and method for forming a diamond like carbo Plasma CVD apparatus and method for forming a diamond like carbo

1985-11-29

1987-02-24

Dixon, Harold

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

118 501, 118620, 118715, 31511131, 31511181, 3133621, 31323131, H01J 724

Patent

active

046459774

ABSTRACT:
A plasma CVD apparatus comprises a first vacuum enclosure with a plasma generating means, an accelerating means for accelerating ions in a plasma toward a substrate and a second vacuum enclosure connected to the first vacuum enclosure, so that the plasma gas flows into the second vacuum enclosure and forms a film of uniform and superior quality at high speed.

REFERENCES:
patent: 3117022 (1964-01-01), Bronson et al.
patent: 4523971 (1985-06-01), Cuomo et al.
patent: 4524303 (1985-06-01), Ritzl
patent: 4574179 (1986-03-01), Masuzawa et al.

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